surface modification, lighting sources, plasma displays, lasers, even environmental remediation. Modeling and simulation can enhance our understanding of ...
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IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 31, NO. 4, AUGUST 2003
Guest Editorial Special Issue on Modeling and Simulation of Collisional or Near-Collisionless Low-Temperature Plasmas
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OLLISIONAL or near-collisionless low-temperature glow discharge plasmas find application in a variety of fields, including plasma-based materials processing and surface modification, lighting sources, plasma displays, lasers, even environmental remediation. Modeling and simulation can enhance our understanding of plasma transport and chemistry, and help develop rational methods for design, control, and optimization of plasma reactors and processes. Significant advances have been made in the modeling and simulation of glow discharge plasmas. Models and simulations of the electron velocity distribution function and associated swarm parameters, plasma transport and chemistry, plasma sheath, and plasma-surface interactions have been advanced. Self-consistent simulations of reactive gas plasmas in complex three-dimensional geometries are feasible. At the same time, powerful plasma diagnostics are used to perform stringent tests of mathematical model predictions. The synergy between modeling, simulation, and laboratory experiments is invaluable for further improving our understanding of glow discharges and for developing better simulation tools with predictive capabilities over a wider range of the parameter space. In this Special Issue of the IEEE TRANSACTIONS ON PLASMA SCIENCE, we have included contributions in the following areas: inductively, capacitively, and wave-driven discharges (including magnetically enhanced plasmas), pulsed plasmas, dc glows, plasma chemistry, plasma sheaths, dusty plasmas,
Digital Object Identifier 10.1109/TPS.2003.816898
plasma-display panels, and electron transport. Both fluid and particle (e.g., particle-in-cell with Monte Carlo collisions) simulation approaches are included. Several contributions combine modeling and/or simulation with experiments. ACKNOWLEDGEMENT The Guest Editors would like to thank the authors for the high quality of their contributions, which resulted in this Special Issue representing the state-of-the-art in modeling and simulation of collisional or near collisionless low-temperature plasmas. Many thanks are due to Dr. S. J. Gitomer, Editor of the IEEE TRANSACTIONS ON PLASMA SCIENCE, for his continual support and encouragement. Last, but not least, a big “thank you” to the referees for their thorough and timely reviewing of manuscripts. DEMETRE J. ECONOMOU, Guest Editor University of Houston Department of Chemical Engineering Houston, TX 77204-4004 USA M. MEYYAPPAN, Guest Editor NASA Ames Research Center Moffett Field, CA 94035 USA TOSHIAKI MAKABE, Guest Editor Keio University Department of Electronics and Electrical Engineering Yokohama 223-8522, Japan
Demetre J. Economou received the M.S. and Ph.D. degrees in chemical engineering from the University of Illinois at Urbana-Champaign, in 1983 and 1986, respectively. Since 1986, he has been with the Chemical Engineering Department at the University of Houston, Houston, TX. His research interests include plasma reactor modeling and simulation, plasma diagnostics, ion–ion plasmas, neutral beam processing, atomic layer etching, plasma-surface interactions, and chemical vapor deposition. He is the author or coauthor of over 120 papers and book chapters in these areas.
0093-3813/03$17.00 © 2003 IEEE
IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 31, NO. 4, AUGUST 2003
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M. Meyyappan (A’85–M’89–SM’96) received the Ph.D. degree in chemical engineering from Clarkson University, Potsdam, NY. He is currently the Director of the Center for Nanotechnology, NASA Ames Research Center, Moffett Field, CA. His research interests include plasma processing of nanomaterials and semiconductors.
Toshiaki Makabe was born in Japan in 1947. He received the B.S., M.S., and Ph.D. degrees in electrical engineering from Keio University, Tokyo, Japan, in 1970, 1972, and 1975, respectively. In 1975, he became an Instructor of electrical engineering at Keio University, where he has been a Professor in the Department of Electronics and Electrical Engineering since 1991 and had bee Head of the department from 1996 to 2000. Currently, he is the Director of the Graduate School of Integrated Design Engineering. His research field is in plasma electronics closely related to low-temperature, nonequilibrium plasmas for material processing, and to the electron(ion) swarm transport theory based on the Boltzmann equation. His recent research interests are in the computational design of the plasma source interacting with wall(wafer) and of a damage free plasma etching. He developed a vertically integrated computer-aided design for device processing (VicAddress) in 2000. VicAddress will be expected to predict and design a plasma structure and trench(hole) etching on a wafer, and to predict an electrical damage to lowernano-scale-elements under charging in future plasma etching. In addition, three-dimensional emission (absorption)-selected computerized tomography (CT) of a low-temperature plasma has been established in his laboratory, and the CT images form a counterpart in the numerical prediction. These projects have been supported by the Semiconductor Technology Academic Research Center (STARC), the Association of Super-Advanced Electronics Technologies (ASET), and Semiconductor Leading Edge Technologies(Selete). Recently, he organized the 21st century COE program for optical and electronic device technology for access network. He is the author of Gaseous Electronics and Its Applications (Norwell, MA: Kluwer; 1991), Plasma Electronics (in Japanese) (Tokyo, Japan: Baifukan; 1999), and Advances in Low Temperature RF Plasmas; Basis for Process Design (Amsterdam, The Netherlands: North-Holland; 2002). He has published more than 130 journal papers and presented more than 250 conference papers. He had the opportunity to give his invited talk at more than 35 International Conferences. He granted 16 Ph.D. degrees to his students in the field of plasma electronics. Dr. Makabe is a Fellow of the Institute of Physics. He has been a Guest Editor of special issues relevant to low-temperature plasmas and related surface processes in the IEEE TRANSACTIONS ON PLASMA SCIENCE, Japanese Journal of Applied Physics, Australian Journal of Physics, the Journal of Vacuum Science and Technology A, and Applied Surface Science. He was on the editorial board of Japanese Journal of Applied Physics and the Transactions of the Institute of Electrical Engineers of Japan. Currently, he is on the Editorial board of Plasma Sources Science and Technology, and The Journal of Physics, D: Applied Physics. He served as the Division Chairman of Plasma Electronics in the Japan Society of Applied Physics. He was the Co-Chair of the Maui Joint Conference between International Conference on Reactive Plasmas (Japan) and Gaseous Electronics Conference (USA).
