In situ investigation of the nature of the active surface of vanadyl pyrophosphate catalysts during n-butane oxidation to maleic anhydride M. Hävecker, R.W. Mayer*, A. Knop-Gericke, H. Bluhm, Bluhm E. Kleimenov, D. Teschner, A. Liskowski, D. Su, R. Schlögl Fritz-Haber-Institut der Max-Planck-Gesellschaft, Dept. Inorg. Chem., Berlin, Germany
* present address: Degussa, Project House Catalysis, Frankfurt / M. Germany
R. Follath Berliner Elektronenspeicherringgesellschaft für Synchrotronstrahlung (BESSY), Berlin, Germany
J.A. Lopez-Sanchez, J.K. Bartley, G.J. Hutchings Department of Chemistry, Cardiff University, Cardiff, United Kingdom XXXVI Jahrestreffen Deutscher Katalytiker, Weimar, Germany, March 19 -21, 2003
e-mail:
[email protected]
n-Butane Oxidation to MA by Vanadium Phosphorus Catalysts O +
3,5 O2
VPO O
400 °C, 1 bar
+
O 1,5 Vol%
air
Maleic Anhydride (MA)
C4H10
+
6,5 O2
4 CO2 +
5 H2O
C4H10
+
4,5 O2
4 CO
5 H2O
+
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
4 H2O
Structural Dynamic VPO VPOsystem: system:capable capableof ofeasily easilyforming formingmany manydifferent differentphases phaseswith withsimilar similar structures structuresoften oftenleading leadingtotomultiphase multiphasesystem system(+ (+highly highlydisordered disorderedphase phase!)!) Activation Activationof ofthe theprecursor: precursor: δ-VOPO δ-VOPO44 VOHPO VOHPO44xx0.5H 0.5H22OO
α-VOPO α-VOPO44 (VO) (VO)22PP22OO77 M. Abon et al., J. Catal., 156 (1995) 28
Transformation Transformationof ofthe thechemistry chemistryof ofthe thematerial materialduring duringthe thecatalytic catalyticprocess process M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Structural Dynamic
Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ? P/V P/Vratio ratio>>1:1: not notcompatible compatiblewith withcrystalline crystalline(VO) (VO)22PP22OO77
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Structural Dynamic
Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ?
intr. activity (norm .u.)
P/V P/Vratio ratio>>1:1: not notcompatible compatiblewith withcrystalline crystalline(VO) (VO)22PP22OO77 2,8 2,3
P10
P9 P2
P12
P13
1,8 P4
1,3 0,8 1,00
P1
1,10
1,20
1,30
P3
1,40
P/V
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Structural Dynamic
Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ? P/V P/Vratio ratio>>1:1: not notcompatible compatiblewith withcrystalline crystalline(VO) (VO)22PP22OO77 VV5+5+centres centresinvolved involved ((G.G.W. W.Coulston Coulstonetetal. al.Science Science267 267(1997) (1997)191 191):): 4+ not valenceof of (VO) (VO)2PP2OO7 notcompatible compatiblewith withVV4+valence 2 2
7
Completely Completelyamorphous amorphousmaterial materialalso alsoactive active ((G.G.J.J.Hutchings Hutchingsetetal., al.,J.J.Catal. Catal.208 208(2002) (2002)197 197))
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Structural Dynamic TEM TEMmicrograph micrographof ofcatalyst catalystparticle: particle:
disordered surface adlayer on well crystallised particles
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Structural Dynamic
Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ? P/V P/Vratio ratio>>1:1: not notcompatible compatiblewith withcrystalline crystalline(VO) (VO)22PP22OO77 VV5+5+centres centresinvolved involved ((G.G.W. W.Coulston Coulstonetetat. at.Science Science267 267(1997) (1997)191 191):): 4+ not valenceof of (VO) (VO)2PP2OO7 notcompatible compatiblewith withVV4+valence 2 2
7
Completely Completelyamorphous amorphousmaterial materialalso alsoactive active ((G.G.J.J.Hutchings Hutchingsetetal., al.,J.J.Catal. Catal.208 208(2002) (2002)197 197)) How Howcan canaastoichiometric stoichiometriccompound compoundserve serveas asaasource sourcefor for77 oxygens withoutcollapse collapseof ofits itsgeometric geometricstructure structure?? oxygensper pern-C n-C4HH10 without 4
10
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Scientific Approach
Catalytic Characterisation Catalytic Characterisation
simultaneous
Surface Characterisation
Comparison with Model Systems
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Catalytic Activity Product Analysis by Online Proton Transfer Reaction Mass Spectrometry (PTR-MS) I(m/e=99) : Maleic Anhydride (MA)
Desorption DesorptionPeak Peak flow / flowofof1.2 1.2vol vol%%CC4H 4H1010 / 20 20vol vol%%OO2 / /78.8 78.8%%He He 2
PPtot ==22mbar mbar tot
const. const.MA MAYield Yield
RT RTtoto400 400°C °C M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Catalytic Activity Relative specific catalytic activity (MA) at different total pressure: 1bar ⇔ 2 mbar
22mbar mbar
PTR-MS Res. MA (a. u.)
InInsitu situXAS XAS P4
0,5 0,4
P9
0,3
P3
0,2 0,1
P1
0 0
1
2
3
4
5
specific activity (norm. u.)
P3 P1 P4 P9
specific specificactivity: activity: Y(MA)/m(cat) Y(MA)/m(cat)
Spec. activity =! 1.00 1.41 4.22 3.29
Intrinsic activity =! 1.00 1.02 1.47 2.39
steady_norm =!1.00 1.17 3.06 3.21
11bbar ar
Surface area =!1.00 1.38 2.89 1.38
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
test testreactor reactor
Spectroscopy
Catalytic Characterisation
simultaneous
Surface Characterisation Surface Characterisation
Comparison with Model Systems
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Experimental Technique: photon in / electron out
X-ray absorption spectroscopy Near Edge X-ray Absorption Fine Structure
X-ray photoelectron spectroscopy M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Experimental Technique: XAS Why X-ray absorption spectroscopy in the soft energy range ? VVLL3-edge very sensitive to 3-edge very sensitive to details detailsof ofthe thechemical chemicalbonding bonding XAS XASas asaalocal localprocess processnot notrestricted restricted totomaterial materialwith withlong longrange rangeorder order Surface Surfacesensitive sensitivewhen whenapplied appliedinin the theelectron electronyield yieldmode mode Can Canbe beapplied appliedunder underreaction reactionconditions conditions A. Knop-Gericke et al., Nucl. Instr. Meth. A 406 (1998) 311 M. Hävecker et al., Angew. Chem. 110 (1998) 2049; Int. Ed. 37 (1998) 206 M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
(Photographs: Luftbild u. Pressefoto R.Grahn)
Experimental Technique: XPS Why X-ray photoelectron spectroscopy at a synchrotron ?
High Highphoton photonflux fluxand andbrilliance brilliance Tuneable Tuneablemonochromatic monochromaticX-ray X-raysource: source: high highspectral spectralresolution resolution variation variationof ofphoton photonenergy energyallows allows depth depthprofiling profiling
P81 / P134 M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
(Photographs: Luftbild u. Pressefoto R.Grahn)
Series of NEXAFS Spectra during temperature cycles
Total Electron Yield (norm. u.)
heating / cooling cycles in n-C4H10/O2/He atmosphere at a total pressure of 2 mbar 6
4000C0C 25
V L3-edge
4
2
0 512
514
516
518
Photon Energy / eV M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
520
The VPO V L3-NEXAFS Analysis of spectral shape by unconstrained least squares fit V5
V L3-edge
V4
Total Electron Yield (norm. u.)
12
400 0C
V3 V2
10
8
VVvalence valence
V6
V7
V1
Local Localgeometric geometric structure structure
6
4
2
Details Detailsof ofthe thelocal local chemical chemicalbonding bonding
25 0C
0 514
516
518
520
Photon Energy / eV M. Abbate et al., J. Electron Spectrosc. Rel. Phenom., 62 (1993) 185 M. Hävecker et al., J. Electron Spectrosc. Rel. Phenom., 125 (2002) 79 M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Relative spectral intensity of V5 at V L3-edge RT
400°C
RT
400°C
Decreaseewhile whileactive active Decreas
Proportion of int. intensity of V5
Total Electron Yield (norm. u.)
Changes of NEXAFS while heating 6
V L3-edge
4
RT
0,55
2
0 512
514
516
518
Photon Energy / eV
0,50
0,45
V5
0,40
MA Yield (a. u.)
0,35
0,30
Spectra number M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
520
rel. Intensity of V5 before first heating cycle =! 1
Total Electron Yield (norm. u.)
Changes in NEXAFS: Relative spectral Intensity 6
V L3-edge
4
2
0
reversible
512
514
516
518
520
Photon Energy / eV
1
norm. Intensity
0,95 0,9
V5
0.96
0.97
0,85 0,8
0.85
0.86
0,75 heating
cooling
heating
cooling
heating: RT → 400°C cooling: 400°C → RT
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
rel. Intensity of V6 before first heating cycle =! 1
Total Electron Yield (norm. u.)
Changes in NEXAFS: Relative spectral Intensity V L3-edge
6
4
2
0
not reversible, related to attached surface molecules ?
512
norm. Intensity
1,8 1,7 1,6 1,5 1,4 1,3 1,2 1,1 1
cooling
518
520
1.31
1.28 heating
516
Photon Energy / eV
V6
1.77
1.61
514
heating
cooling
heating: RT → 400°C cooling: 400°C → RT
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Investigation of 3 catalysts of different intrinsic (Y(MA)/surf. area) catalytic activity
YMA (P1)
x 1.6
>
x 1.5
YMA (P2) > YMA (P3)
(J. A. Lopez-Sanchez et al., to be published)
Total Electron Yield (norm. u.)
Comparison: Catalysts of different performance 6
V L3-edge
4
2
0 512
514
516
518
520
Photon Energy / eV
1
0,9
V5
0,85 0,8
he a P2 t . he a P1 t . he at .
P3
co o P2 l. co o P1 l. co ol .
P3
he a P2 t . he a P1 t . he at .
0,75
P3
norm. Intensity
hig act hest ivi ty
0,95
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
heat.: RT → 400°C cool.: 400°C → RT
Comparison: VPO and V2O5
Catalytic Characterisation
simultaneous
Surface Characterisation
Comparison with Model Systems Comparison with Model Systems
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Interpretation of V L3 NEXAFS
Redistribution of spectral weight in NEXAFS (+ slight shift of resonance position) Change of the d-electron density Change of the local electronic structure
Assignment of certain regions in NEXAFS (resonances (V5, V6)) to specific V-O bonds : V2O5 as model system for VPO
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Vanadyl Pyrophosphate Structure
Oxygen a
b
Vanadium
Oxygen
c
o Ph sp us ro ho M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
NEXAFS of VPO and V2O5
V L3-edge
Total Electron Yield (a. u.)
2
1.5
V2O5
1
0.5
VPO 0
514
516
518
520
Photon Energy / eV M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Interpretation of V L3 NEXAFS Identification of resonances (V5, V6): O(1a)
V2O5 as model substance for VPO DFT DFTcalculation calculationof ofDOS DOS(V (V22OO55!)*: !)*:
O(3)
O(2) V
VV2OO5::Close relationship between geometric and 2 5 Close relationship between geometric and O(3) electronic -absorptionedge edge electronicstructure structureatatVVLL3-absorption
O(2)
3
O(1b)
⇒ ⇒main maincontributions contributionstoto NEXAFS NEXAFSresonances resonances appear appearininaasequence sequenceof of V-O V-Obond bondlength length M. Hävecker et al., J. Electron Spectrosc. Rel. Phenom., 125 (2002) 79
⇒ ⇒V6: V6:O(1a) O(1a) ⇒ ⇒V5: V5:?? (similar (similartotoO(2)) O(2)) *Eyert et al., Phys. Rev. B 57 (1998) 12727
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Summary NEXAFS changes partially reversible under n-butane oxidation conditions (resonance intensity, resonance position) Observation of dynamic rearrangements (electronic and/or geometric structure) of VPO catalyst under n-butane oxidation conditions (M. Hävecker et al., J. Phys. Chem., accepted) in line with: N.-Y. Topsøe et al., Cat. Lett. 76 (2001) 11 (vanadia DeNOx catalysts)
Structural flexibility influences the catalytic activity Unlikely that a stoichiometric bulk phase like (VO)2P2O7 facilitates this reversible structural changes Support for dynamic surface concept (J.- C. Volta., Catal. Today, 32 (1996) 29) M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany
Thanks !
BESSY BESSYstaff staff Fritz-Haber-Institut Fritz-Haber-Institut Ute UteWild Wild Alexey AlexeyPestryakov Pestryakov
Deutsche DeutscheForschungsgemeinschaft Forschungsgemeinschaftfor forfinancial financialsupport support(SFB (SFB546) 546)
M. Hävecker, Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany