Nanofabrication technologies - Archive ouverte HAL

Nanofabrication technologies for nanophotonics Igor Ozerov Aix-Marseille Univ, CNRS, CINaM 13288 Marseille France

Igor OZEROV

Summer School on Plasmonics 4

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1

Monday 4th September 2017

Relative precision of nanofabrication

1% Igor OZEROV


Image: M. Madou, ‘Fundamentals of microfabrication’

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Nanomanufacturing

Imboden and Bishop, Top-down nanomanufacturing, Physics Today 67, 45 (2014) Igor OZEROV


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Plan • Introduction (top-down processes) – – – –

• • • • • • •

Deposition Etching Lithography Focused electron and ion beam tecniques

Exemples plasmonic Exemples chiral structures Dielectric photonics, silicon Exemples, coloration Nanosphere lithography (bottom-up) Laser-driven methods Nanofabrication using vortex beams

Igor OZEROV


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Nano- et microfabrication approaches

Igor OZEROV

Top-Down

Bottom-Up

micromachining from bulk to nano

growth and assembly of nano-objets


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Deposition (additive technics)

Magnetron sputtering (Al, Cr, Ti & W) Reactive sputtering (nitrides and oxides) in gas environment Igor OZEROV


Evaporation (Ag, Al, Au, Cr, Cu & Ni) in vacuum

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Magnetron Sputtering substrate

ee-

plasma ee-

e-

e-

magnet Igor OZEROV


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Step coverage in sputtering and evaporation deposition

S. Franssila, Introduction to Micro Fabrication. Wiley, 2004 .

Igor OZEROV


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Nanocones by Directional Evaporation

J.M. Kontio et al. / Microelectronic Engineering 87 (2010) 1711–1715 Igor OZEROV


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Top-Down Approach Typical steps Deposition

Litho

Cleaning

Nanofabrication Etching

Carac terisation

Igor OZEROV


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Dry Plasma and Wet Etching Wet Chemical Etching Reactive Ion Etching (RIE) by Plasma gases: CHF3 SF6 O2 materials : Si SiO2 Si3N4 TiO2 WO3

Capacitively (CCP) and Inductively coupled plasma (ICP) Argon ion milling

High aspect ratio reactive ion etching of silicon

Igor OZEROV


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Dry Plasma and Wet Etching mask

Isotropic wafer

(Example wet : Au in KI3)

Anisotropic Example wet : Si in KOH Example dry : Si by SF6:O2

wafer

Igor OZEROV


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Reactive Ion Etching Formation of active species in plasma Elimination of volatile products

e-

e-

plasma Surface chemical reactions

Igor OZEROV

e-


Surface Desorption

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Reactive Ion Etching of Si

Igor OZEROV


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Alcaline Wet Etching of Silicon

Igor OZEROV


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Crystalline silicon nanostructures KOH or TMAH ? KOH {110}>{100}>{111}

TMAH {100}>{110}>{111}

Selective chemical etching, Cr/Au mask J. Proust, F. Bedu, S. Chenot, I. Soumahoro, I. Ozerov, B. Gallas, R. Abdeddaim, and N. Bonod, Advanced Optical Materials, vol. 3, pp. 1280-1286, 2015. Igor OZEROV


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Focused Ion Beam Milling Focused ion beam Ga+ @ 30kV Etched atoms

retrodiffused Ga ions

Nanohole array in a SiC crystal

Images: Frédéric BEDU Igor OZEROV


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Local Focused Ion Beam (FIBID) and Electron Beam Induced Deposition (EBID) beam

Precursor gas

Tungsten nanodots deposition (EBID) Igor OZEROV


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Local Electron Beam Induced Deposition (EBID)

W nanowire

Courtesy Frédéric Bedu and Marion Descoins Igor OZEROV


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Litho

Cleaning


Carac terisation

Igor OZEROV


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UV and e-beam lithography UV Resist

O2

Mask

Scanning electron or ion beam





1) Plasma cleaning

2) Spin-coating

3) « SOFT » bake 4) Alignement and exposure

5) Post-exposure bake 6) Developpment

7) « HARD » bake 8) Inspection

Igor OZEROV


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Electron beam lithography System Pioneer (RAITH)

Field Emission Gun (FEG) 2nm Laser interferometer Stage Stitching and Alignement

Plasmonic color printing

gap ->

Kumar, Duan, Hegde, Koh, Wei & Yang Nature Nanotechnology, 7, 557–561 (2012) Igor OZEROV


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Plasmonic Dual-State Nanopixels

Nanofabrication using : metal-evaporation of aluminum film electron-beam lithography reactive ion etching and inductively coupled plasma deposition

Heydari, Sperling, Neale, and Clark Adv. Funct. Mater. 2017, 1701866

Igor OZEROV


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Switchable QR-code

Bright-field and SEM images of a switchable QR-code

Heydari, Sperling, Neale, and Clark, Adv. Funct. Mater. 2017, 1701866 Igor OZEROV


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Plasmonic and All-dielectric nanophotonics

Baranov, …, Evlyukhin, Chichkov Igor OZEROV

Optica, Vol. 4, Issue 7, pp. 814-825 (2017)


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Dielectric photonics Resonant dielectric nanostructures Kuznetsov, Miroshnichenko, Brongersma, Kivshar & Luk’yanchuk, Science 2016

Mie resonances of a spherical particle

Igor OZEROV


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Materials for dielectric photonics Crystalline and amorphous Silicon n~3.5 in the visible and near IR range Low losses Cheap Robust Chemically stable Compatible with microelectronic processing Igor OZEROV


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Amorphous Si resonators

Advanced Optical Materials, 3, 1280–1286, Septembre 2015 Igor OZEROV


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Nanofabrication of silicon structures (or Ni for RIE)

WET ALCALINE or PLASMA RIE Igor OZEROV

Control of the nanostructure shape and size


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Crystalline silicon nanostructures KOH or TMAH ? KOH {110}>{100}>{111}

TMAH {100}>{110}>{111}

Selective chemical etching, Cr/Au mask J. Proust, F. Bedu, S. Chenot, I. Soumahoro, I. Ozerov, B. Gallas, R. Abdeddaim, and N. Bonod, Advanced Optical Materials, vol. 3, pp. 1280-1286, 2015. Igor OZEROV


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Crystalline silicon nanostructures Alcaline etching

Igor OZEROV


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Crystalline silicon nanostructures Alcaline etching

Igor OZEROV


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Scattering from individual Si particles D i a m e t e r

2015 Proust, Bedu, Chenot, Soumahoro, Ozerov, Gallas, Abdeddaim, and Bonod Igor OZEROV


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Colometry (amorphous silicon)

Igor OZEROV


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Scattering from individual Si cylinders

Igor OZEROV


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Amorphous silicon structures for nanoscale painting Dark Field Microscopy 500 x 500µm

d=130nm d=100nm d=70nm d=210nm no structures

Piet Mondrian (1872-1944)

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Edvard Munch, The scream (1863–1944)

2017

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Flauraud, Reyes, Paniagua-Domínguez, Kuznetsov, and Brugger


Black Silicon Antireflective Coating

2011 Spinelli, Verschuuren & Polman

2016 Proust, Fehrembach, Bedu, Ozerov & Bonod DOI: 10.1038/srep24947

Igor OZEROV


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Black Silicon Antireflective Coating nanofabrication steps

DOI: 10.1038/srep24947

Igor OZEROV


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Litho

Cleaning


Carac terisation

Igor OZEROV


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All-dielectric zero-index optical metamaterial from λ = 1432 nm to 1457 nm the permittivity is negative but the permeability remains positive

electron-beam lithography, and RIE were used to structure the multilayer film Igor OZEROV Summer School on Plasmonics 4 Porquerolles Monday 4th September 2017

Nanoimprint Lithography Fabrication of master stamp

The resist is cured with UV light or thermally

The remaining resist should be etched by RIE Jung and Byun Biomed Eng Lett (2011) 1:153-162 Igor OZEROV


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Nano- et microfabrication approaches

Igor OZEROV

Top-Down

Bottom-Up

micromachining from bulk to nano

growth and assembly of nano-objets


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Nanosphere Lithography

D. Ingert, 2007

Igor OZEROV


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Bead self-assembly strategies drop-coating

dip-coating

spin-coating

electrophoretic deposition

transfer from the gas/liquid to the gas/solid interface

self-assembly at the gas/liquid interface Ye and Qi, Nano Today (2011) 6, 608—631 Igor OZEROV


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Nanosphere Lithography Evaporation Lift-off Silver Gold Nickel Aluminum

Jörg Linder SPIE 10.1117/2.1201310.005154

Y. Song, H.E. Elsayed-Ali / AppliedSurfaceScience 256 (2010) 5961–5967 Igor OZEROV


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Tuning pit-size with Al thickness

Sputtering & Lift-off Pi, Dillard, Alameddine, Benard, Wahl, Ozerov, Charrier, Limozin, Sengupta, Nano Letters, 15, 5178−5184 (2015) Igor OZEROV


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Nanosphere Lithography

Etching of Gold Igor OZEROV


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Fabrication of nanopillars by nanosphere lithography

Deep Etching of Silicon Cheung et al. Nanotechnology 17 (2006) 1339–1343

Igor OZEROV


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Laser Generation and Printing of Gold Nanoparticles

Barchanski, Evlyukhin, Koroleva, Reinhardt, Sajti, Zywietz and Chichkov 2014

Igor OZEROV


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Laser Generation and Printing of Silicon Nanoparticles

Barchanski, Evlyukhin, Koroleva, Reinhardt, Sajti, Zywietz and Chichkov 2014

Igor OZEROV


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Photopolymerisation direct laser writing in photoresists

geometric phase optical elements

Wang et al. Appl. Phys. Lett. 110, 181101 (2017) Igor OZEROV


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Laser-assisted fabrication of 3D chiral microstructures

Scalebar 2µm J. Ni et al. Light: Science & Applications (2017) 6, e17011 Igor OZEROV


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Laser-assisted fabrication of 3D chiral microstructures

Scalebar 5µm

J. Ni et al. Light: Science & Applications (2017) 6, e17011 Igor OZEROV


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Mode sorter for vortex beams produced by 3D laser printing

LIGHTMAN et al., Optica 4 (2017) 605

Scalebar 25µm

S. Lightman et al. Optica (2017) 4, 6051 Igor OZEROV


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Nanomanufacturing

Imboden and Bishop, Top-down nanomanufacturing, Physics Today 67, 45 (2014) Igor OZEROV


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Conclusions Nanofabrication deals with Precision Resolution Process Speed Area to be treated Cost 2D layer by layer or 3D direct writing

Sometimes low-cost bottom-up methods give excellent results

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Acknowledgements

Frédéric BEDU

Yeon Ui LEE

Igor OZEROV

Benjamin DEMIRDJIAN

Jeong Weon WU


Julien PROUST

Nicolas BONOD

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Thank you for your attention!

Igor OZEROV


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