Process Platform for Passive RFID Tags Based on ...

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May 8, 2006 - 3. SEMICONDUCTOR LTD. Passive RFID tag examples. RFID tag Sticker. SmartCode. RFID tag Micro-chip. Plastic encapsulated RFID tag.
Process Platform for Passive RFID Tags Based on CMOS VLSI process May 08 2006 Ira Naot, Sharon Levin, Ishai Nave, Yossi netzer, Shye Shapira,

Passive RFID tag

Passive RFID tag examples

Passive RFID Challenges RFID tag Micro-chip

• “Answer-back” to an active reader

Tower Semiconductor Ltd

• Store information transmitted by reader

• Cost • Highly Integrated System

• Wide-spread use on low-cost products  Low-cost is a must!!

• Power generation and Usage Rectifier

Antenna

( No power supply)

Plastic encapsulated RFID tag

Charge Pump

Intermec

Logic

Transponder switch

RFID tag Sticker SmartCode

• Integrated Non-volatile memory • Large voltage variations

De-Modulator NVM

• Harsh ESD Environment RFID tag on back of shipping label Symbol Technology

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Cost / Integration Challenge

Power Challenge – power supply

• Target price is few cents for complete tag

• Limited available power at antenna:

• Generate Vdd using in-chip charge-pump Vdd supply

• For efficient rectification:

• System-on-chip, one chip solution (reduce BOM, simplify assembly)

Must have Low Vf devices

• Fabrication based on standard CMOS VLSI process

Converted to DC Vf

• Use deep sub-micron process, reduce logic and NVM area, more dies per wafer, reduce die price

Chip Bulk

Typical Charge-Pump Schematic 5

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Standard Vt NMOSFET vs. Native NMOS Transistor

Standard Diode vs. Integrated-Schottky-diode Diode I/V Comparison

0.0012 0.001

•Solutions at Tower: •Integrated Schottky diode (See poster) •Native (Zero-Vt) MOSFET 7

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Power Challenge – Power usage •Optimized low-leakage devices for “state-holding” registers •Utilizing 0.18 micron devices for optimal Vdd range and low leakage

Std Vt Native M O SFET

5.0E-04

4.0E-04

0.0006

3.0E-04

[A ]

Id Id [A]

0.0008

[A /um

Current 2] 2] Current [A/um

Junction Diode Integrated Schottky

•Requirements •Must have low forward voltage •Maximize ratio of forward to reverse currents •Minimize parasitic capacitances (for minimal RF power dissipation) •Integrated in chip fabrication •No added process steps/masks •Challenge: •Standard CMOS devices have Vf > 0.5V

•Logic for low power, Allowed Vdd range of 1.0V to 2.2V

Id/Vg Curves, W /L=10/0.5, Vd=0.1V 6.0E-04

0.0014

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Efficient Rectification Device Requirements

(Typically 50 to 500 µW)

•T.S.L. Meeting RFID challenge:

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2.0E-04

0.0004 0.0002

1.0E-04

0 0

0.2

0.4

0.6

0.8

1

0.0E+00

1.2

0.0

0.2

0.4

0.6

0.8

1.0

1.2

Vg [V]

Applied bias [V]

0.18µm logic cells, Tower Semiconductor Ltd.

Data: Tower Semiconductor Ltd.

Data: Tower Semiconductor Ltd. 8

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Existing ESD solutions in VLSI

ESD Challenges in passive RFID

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Tower RFID platform •Custom Solution for RFID:

• Inherent risk of ESD in RFID tags: • Attached antenna • Plastic/paper sticker

To Internal Circuit

• Ideal ESD protection device: VLSI circuit of RFID tag

pulse !

•No added processes/masks

•Common solution in CMOS VLSI

(discharge during peel-off)

1 to 3 A

•Optimized for symmetric RF signal

•Grounded-Gate NMOS:

To Internal Circuit

•Meets ESD protection requirements •Large parasitic capacitance •Inherent parasitic diode: Clipping RF signal

• In normal operation = Open

TSL ESD circuit for RFID

• In ESD event = Short

•Floating circuit, minimal signal clipping •Minimized RF parasitics •Can design loss/hardness trade-off

• Real ESD protection device: • Added parasitics in normal operation

Vf

• In ESD event: • Finite resistance

ElectroStatic Discharge event 11

• Finite current capacity

Vf SEMICONDUCTOR LTD.

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Building-blocks Customized for RFID

NVM solution for RFID

Included in fabrication process, no added process steps

Passive RFID applications require 100 to 256 bits of Non-Volatile-Memory Field programmable, Multi-time programming (Erasable)

Schottky diodes:

Tower. RFID-Flash main Characteristics

• Low Vf

Size:

• Low parasitic capacitance

Power

0.10 mm2 for 192 bits Supply Voltage: 1.0 V to 2.2 V, read/standby

• Characterized for RF operation

1.8 V to 2.2 V, write/erase Organization:

Native NMOS:

16-bit configurable data input bus for commands & programming

• Zero Vt device

Flexible store operation, 16bit or 192bit (full array store) Reliability

Endurance, 1000 store cycles

Combining Low-leakage transistor and capacitor:

Read cycles, 1010 per store operation

• State-holding “d-ram-like” device

Data retention specification: 10 years at 70 °C

• Immune to momentary power loss 14

Characteristics

Standard Tower 0.18 microns 3-level-metal CMOS process SEMICONDUCTOR LTD.

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